SSEC 3300 ML systems implement automatic processing with manual load of wafers or substrates, and are dry-in/-out for maximum operator safety with harsh chemistries. They are available in either bulkhead or ballroom styles, with air in the mini-environment processed by ULPA filtration. Tooling supports wafers to 300 mm or glass substrates to 10" square.

The molded Halar single wafer processing module in the SSEC 3300 ML system is configurable with up to seven dispense arms and four chemical drains. The dispense arms may be fitted with high velocity sprays, megasonic scrubs, PVA brush assemblies, chemistry application nozzles, and more. The system includes onboard chemistry management, with recipe-driven, closed-loop controlled chemistry blending and true single wafer, on-the-fly temperature control. For many applications, in-situ, adaptive process control is provided by SSEC’s exclusive WaferChek™ system, which manages the wet chemistry processing by the optical properties of the wafer surface.

The SSEC 3300 family of wet cleaners and processors implements single wafer technology in application-specific configurations for cleaning, coating, developing, etching, and solvent processing in a completely digital processing environment. The Windows®-based, object-oriented software provides a convenient user interface, and supports complete management of processing and data logging.

All systems are SEMI® S2-0703aE safety and S8-0705 ergonomic compliant, CE marked, and ETL listed.